12th Physics

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p-n junction diode under reverse bias

When an external voltage (V ) is applied across the diode such that n-side is positive and p-side is negative, it is said to be reverse biased [Fig.14.15(a)]. The applied voltage mostly drops across the depletion region. The direction of applied voltage is same as the direction of barrier potential. As a result, the barrier height increases and the depletion region widens due to the change in the electric field. The effective barrier height under reverse bias is (V0 + V ), [Fig. 14.15(b)]. This suppresses the flow of electrons from n → p and holes from p → n. Thus, diffusion current, decreases enormously compared to the diode under forward bias. The electric field direction of the junction is such that if electrons on p-side or holes on n-side in their random motion come close to the junction, they will be swept to its majority zone. This drift of carriers gives rise to current. The drift current is of the order of a few µA. This is quite low because it is due to the motion of car...

p-n junction diode under forward bias

When an external voltage V is applied across a semiconductor diode such that p-side is connected to the positive terminal of the battery and n-side to the negative terminal , it is said to be forward biased. The applied voltage mostly drops across the depletion region and the voltage drop across the p-side and n-side of the junction is negligible. (This is because the resistance of the depletion region – a region where there are no charges – is very high compared to the resistance of n-side and p-side.) The direction of the applied voltage (V ) is opposite to the built-in potential V0. As a result, the depletion layer width decreases and the barrier height is reduced . The effective barrier height under forward bias is (V0 – V ). If the applied voltage is small, the barrier potential will be reduced only slightly below the equilibrium value, and only a small number of carriers in the material—those that happen to be in the uppermost energy levels—will possess enough energy to...

p-n JUNCTION

A p-n junction is the basic building block of many semiconductor devices like diodes, transistor, etc.A clear understanding of the junction behaviour is important to analyse the working of other semiconductor devices. We will now try to understand how a junction is formed and how the junction behaves under the influence of external applied voltage (also called bias). p-n junction formation : Consider a thin p-type silicon (p-Si) semiconductor wafer. By adding precisely a small quantity of pentavelent impurity, part of the p-Si wafer can be converted into n-Si. There are several processes by which a semiconductor can be formed. The wafer now contains p-region and n-region and a metallurgical junction between p-, and n- region. Two important processes occur during the formation of a p-n junction: diffusion and drift. We know that in an n-type semiconductor, the concentration of electrons (number of electrons per unit volume) is more compared to the concentration of holes. Similarly,...

p-type semiconductor

This is obtained when Si or Ge is doped with a trivalent impurity like Al, B, In, etc. The dopant has one valence electron less than Si or Ge and, therefore, this atom can form covalent bonds with neighbouring three Si atoms but does not have any electron to offer to the fourth Si atom. So the bond between the fourth neighbour and the trivalent atom has a vacancy or hole. Since the neighbouring Si atom in the lattice wants an electron in place of a hole, an electron in the outer orbit of an atom in the neighbourhood may jump to fill this vacancy, leaving a vacancy or hole at its own site. Thus the hole is available for conduction. Note that the trivalent foreign atom becomes effectively negatively charged when it shares fourth electron with neighbouring Si atom. Therefore, the dopant atom of p-type material can be treated as core of one negative charge along with its associated hole. It is obvious that one acceptor atom gives one hole. These holes are in addition to the intr...

n-type semiconductor

Suppose we dope Si or Ge with a pentavalent element. When an atom of +5 valency element occupies the position of an atom in the crystal lattice of Si, four of its electrons bond with the four silicon neighbours while the fifth remains very weakly bound to its parent atom. This is because the four electrons participating in bonding are seen as part of the effective core of the atom by the fifth electron. As a result the ionisation energy required to set this electron free is very small and even at room temperature it will be free to move in the lattice of the semiconductor. For example, the energy required is ~ 0.01 eV for germanium, and 0.05 eV for silicon, to separate this electron from its atom. This is in contrast to the energy required to jump the forbidden band (about 0.72 eV for germanium and about 1.1 eV for silicon) at room temperature in the intrinsic semiconductor. Thus, the pentavalent dopant is donating one extra electron for conduction and hence is known as donor impu...

Extrinsic Semiconductor

The conductivity of an intrinsic semiconductor depends on its temperature, but at room temperature its conductivity is very low. As such, no important electronic devices can be developed using these semiconductors. Hence there is a necessity of improving their conductivity. This can be done by making use of impurities. When a small amount, say, a few parts per million (ppm), of a suitable impurity is added to the pure semiconductor, the conductivity of the semiconductor is increased manifold. Such materials are known as extrinsic semiconductors or impurity semiconductors. The deliberate addition of a desirable impurity is called doping and the impurity atoms are called dopants. Such a material is also called a doped semiconductor. The dopant has to be such that it does not distort the original pure semiconductor lattice. It occupies only a very few of the original semiconductor atom sites in the crystal. A necessary condition to attain this is that the sizes of the dopant and the ...